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將硅片放入擴(kuò)散爐前，應(yīng)先對(duì)其進(jìn)行清洗，以去除其表面的雜質(zhì)和顆粒。這被稱(chēng)為“預(yù)擴(kuò)散清潔”。我們可以使用多種方法進(jìn)行預(yù)擴(kuò)散清潔。? ?

Before silicon wafers are placed in a diffusion furnace, they should be cleaned first to remove impurities and particles from their surfaces.This is known as “pre-diffusion cleaning.” Pre-diffusion cleaning can be done using various methods.

1.RCA清洗工藝（主要包括兩步）

? ? ? ??標(biāo)準(zhǔn)清潔 1 (SC1)-使用含有氫氧化銨和過(guò)氧化氫的溶液清潔硅片，這有助于去除有機(jī)顆粒。然而，金屬離子仍然存在于晶片表面。

Standard cleaning 1 (SC1) – The silicon wafers are cleaned with a solution containing ammonium hydroxide and hydrogen peroxide, which helps in removing organic particles. However, the metallic ions are still present in the wafers’ surfaces.

標(biāo)準(zhǔn)清洗 2 (SC2)-經(jīng)過(guò) SC1 后，硅片在含有鹽酸和過(guò)氧化氫的浴槽中清洗。該解決方案可去除晶片表面殘留的金屬痕跡。

Standard cleaning 2 (SC2) – After undergoing the SC1, the silicon wafers are cleaned in a bath containing hydrochloric acid and hydrogen peroxide. This solution removes leftover metallic traces from the wafers’ surfaces.

2.刻蝕清潔

這種方法使用硫酸和過(guò)氧化氫的溶液，從晶片上溶解更多和更頑固的有機(jī)殘留物。

? ? ? ? This method uses a solution of sulfuric acid and hydrogen peroxide, which dissolves larger and more stubborn amounts of organic residue from the wafers.

3.兆聲波清洗

使用由兆聲波在浴槽中產(chǎn)生的空化氣泡去除晶片上的雜質(zhì)。與其他方法不同，兆聲波清洗不使用刺激性化學(xué)浴。

? ? ? ?Uses cavitation bubbles produced by megasonic waves in a bath to remove impurities from the wafers. Unlike other methods, megasonic cleaning doesn’t use harsh chemical baths.

4.臭氧清洗

? 使用去離子 (DI) 水將晶片上的無(wú)機(jī)污染物沖洗掉。然后將晶片放置在臭氧室內(nèi)。臭氧強(qiáng)大的氧化作用將有機(jī)顆粒轉(zhuǎn)化為碳，使晶片保持清潔，不含雜質(zhì)。?

? ? ? ? Uses deionized (DI) water to rinse the inorganic contaminants away from the wafers. Then the wafers are placed inside the ozone chamber. The ozone’s powerful oxidizing action converts the organic particles to carbon, leaving the wafers clean and free from impurities.

? 未徹底清潔的晶片可能會(huì)影響后續(xù)的擴(kuò)散步驟并對(duì)最終產(chǎn)品產(chǎn)生負(fù)面影響。這就是為什么預(yù)擴(kuò)散清潔很重要。華林科納提供完整的濕處理設(shè)備系列，支持上述晶圓清洗工藝。這些旨在提供有效的清潔，使硅晶片無(wú)顆粒并準(zhǔn)備好擴(kuò)散。

??Unthoroughly cleaned wafers may affect subsequent diffusion steps and negatively affect the final product.That is why pre-diffusion cleaning is important.Hualinkena provides a complete range of wet treatment equipment that supports the above wafer cleaning process.These are intended to provide effective cleaning, making the silicon wafer grain-free and ready to spread.